Surface diffusion and recombination of O, N, H atoms on silicon wafer and silica.

被引：0
|
作者：
Kim, YC [1 ]
Yi, SC [1 ]
机构：
[1] HANYANG UNIV,DEPT CHEM ENGN,SEOUL 133791,SOUTH KOREA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1996年 / 212卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
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页码：286 / PHYS
页数：1
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