The Influence of Cycle Sputtering Deposition on the Properties of Cu2ZnSnS4 Thin Films

被引：0

作者：

Sun, Y. M. ^{[1
,2
,3
,4
]}

Yao, B. ^{[1
,2
,3
]}

Long, D. ^{[4
]}

Meng, X. C. ^{[4
]}

Liu, L. H. ^{[4
]}

Hua, Z. ^{[4
]}

机构：

[1] Jilin Univ, State Key Lab Superhard Mat, Changchun 130023, Peoples R China

[2] Jilin Univ, Coll Phys, Changchun 130023, Peoples R China

[3] Jilin Univ, Coll Phys, Key Lab Phys & Technol Adv Batteries, Minist Educ, Changchun 130012, Peoples R China

[4] Jilin Normal Univ, Key Lab Funct Mat Phys & Chem, Minist Educ, Siping 136000, Peoples R China

来源：

ACTA PHYSICA POLONICA A | 2016年 / 129卷 / 06期

基金：

中国国家自然科学基金;

关键词：

SULFURIZATION;

D O I：

10.12693/APhysPolA.129.1169

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Three kinds of precursor thin films with stacking orders of Cu/Sn/ZnS, Cu/Sn/ZnS/Cu/Sn/ZnS and Cu/Sn/ZnS/Cu/Sn/ZnS/Cu/Sn/ZnS were prepared by magnetron sputtering and annealed with sulfur powder. The microstructure, morphology and optical properties of thin films were investigated by X-ray diffraction, the Raman scattering, scanning electron microscopy and UV-visible spectrophotometer. The increase of cycle number decreases the sulfurizing temperature of the formation of Cu2ZnSnS4 phase. Chemical composition can be controlled by cycle sputtering deposition. After sulfurizing at 500 degrees C, the particle size and the band gap increase with increasing cycle number.

引用

页码：1169 / 1172

页数：4

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