Tetragonal tungsten oxide nanobelts synthesized by chemical vapor deposition

被引:55
|
作者
Wu, Wei [1 ]
Yu, Qingkai [1 ]
Lian, Jie [2 ]
Bao, Jiming
Liu, Zhihong
Pei, Shin-Shem [1 ]
机构
[1] Univ Houston, Ctr Adv Mat, Houston, TX 77204 USA
[2] Rensselaer Polytech Inst, Troy, NY 12180 USA
关键词
X-ray spectroscopy in chemical analysis; Vapor phase epitaxy; Nanomaterials; CRYSTAL-STRUCTURE; WO3; NANOWIRES; GROWTH; PHASE; TRANSITIONS;
D O I
10.1016/j.jcrysgro.2010.07.057
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Tungsten trioxide (WO3) nanobelts in tetragonal structure were grown on Si substrates by a hot-wall chemical vapor deposition (CVD) method without using catalysts. The products were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), transmission electron microscopy (TEM), Raman spectroscopy, and photoluminescence (PL) spectrum. The width of the nanobelts is in the range of 50-100 nm with width-to-thickness ratios of 5-10 and lengths of up to tens of micrometers. These nanobelts grew along the [0 0 1] direction and can be identified as the tetragonal WO3 structures. Raman and PL measurements indicate the high quality of the nanobelts. The vapor-solid growth mechanism could be applicable in our experiment. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:3147 / 3150
页数:4
相关论文
共 50 条
  • [41] Model reduction for a tungsten chemical vapor deposition system
    Chang, HY
    Adomaitis, RA
    DYNAMICS & CONTROL OF PROCESS SYSTEMS 1998, VOLUMES 1 AND 2, 1999, : 35 - 40
  • [42] CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN CARBIDE DENDRITES
    TAKAHASHI, T
    ITOH, H
    JOURNAL OF CRYSTAL GROWTH, 1972, 12 (04) : 265 - +
  • [43] Anomalous selective tungsten growth by chemical vapor deposition
    Mei, YJ
    Chang, TC
    Sheu, JD
    Yeh, WK
    Pan, FM
    Chang, CY
    ADVANCED METALLIZATION FOR FUTURE ULSI, 1996, 427 : 399 - 405
  • [44] Tungsten Deposition by Metal-Chloride-Reduction Chemical Vapor Deposition
    Hirose, F.
    Watanabe, T.
    Shibata, A.
    Momiyama, K.
    Suzuki, T.
    Miya, H.
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 2011, 14 (07) : H251 - H253
  • [45] TUNGSTEN DEPOSITION BY ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION WITH ORGANOTUNGSTEN PRECURSORS
    SPEE, CIMA
    VERBEEK, F
    KRAAIJKAMP, JG
    LINDEN, JL
    RUTTEN, T
    DELHAYE, H
    VANDERZOUWEN, EA
    MEINEMA, HA
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1993, 17 (1-3): : 108 - 111
  • [46] PREPARATION OF AMORPHOUS ELECTROCHROMIC TUNGSTEN-OXIDE AND MOLYBDENUM OXIDE BY PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION
    TRACY, CE
    BENSON, DK
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1986, 4 (05): : 2377 - 2383
  • [47] Synthesis of Tungsten Oxide Nanoslab Bundles by Microwave Plasma-Enhanced Chemical Vapor Deposition
    Hsieh, Yun Tsung
    Hsueh, Sen Hung
    Chen, Uei Shin
    Huang, Meng Wen
    Shih, Han C.
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (01)
  • [48] Hot-wire chemical vapor deposition of crystalline tungsten oxide nanoparticles at high density
    Mahan, AH
    Parilla, PA
    Jones, KM
    Dillon, AC
    CHEMICAL PHYSICS LETTERS, 2005, 413 (1-3) : 88 - 94
  • [49] Modeling and validation of chemical vapor deposition of tungsten for tungsten fiber reinforced tungsten composites
    Raumann, L.
    Coenen, J. W.
    Riesch, J.
    Mao, Y.
    Gietl, H.
    Hoeschen, T.
    Linsmeier, Ch
    Guillon, O.
    SURFACE & COATINGS TECHNOLOGY, 2020, 381
  • [50] A new tungsten gate metal oxide semiconductor capacitor using a chemical vapor deposition process
    Yeh, WK
    Shiau, YC
    Chen, MC
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1997, 144 (01) : 214 - 217