Interface Reaction of Pb-free Sn-3.5Ag Solder with Ni-Sn-P Metallization

被引:0
|
作者
Yang, Y. [1 ]
Teh, P. F. [1 ]
Sumboja, A. [1 ]
Chen, Z. [1 ]
机构
[1] Nanyang Technol Univ, Sch Mat Sci & Engn, Singapore 639798, Singapore
关键词
FLIP-CHIP TECHNOLOGY; ELECTROLESS-DEPOSITION; BUMP METALLIZATION; AG SOLDER; MECHANICAL STRENGTH; TENSILE-STRENGTH; CU-P; JOINTS; COATINGS; ALLOYS;
D O I
10.1109/EPTC.2009.5416457
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The electrolessly plated Ni-P has been extensively studied due to its coating uniformity, selectivity and low coating stress. However, the use of lead-free solders accelerates interfacial reaction because its higher melting points and higher Sn content than the conventional Pb-Sn solders. In this work, we developed a ternary electroless Ni-Sn-P (7 similar to 8 wt.% of P and 1.4 wt.% of Sn) alloy to be used as the soldering metallization. Besides having good solderability, the presence of Sn in electroless Ni-Sn-P changes the diffusion process during soldering reflow. Comparison was made with the results obtained from commercial binary Ni-P (7 similar to 8 wt.% of P) metallization. The microstructure of the interfacial IMCs for Ni-P/Sn-3.5Ag and Ni-Sn-P/Sn-3.5Ag solder joints were investigated under different reflow durations at 260 degrees C. The diffusion mechanisms of solder reaction for both types of solder joints were discussed. In addition, it was found that the consumption rate of plated Ni-Sn-P layer is faster than that of Ni-P layer up to 30 cycles of reflow at 260 degrees C.
引用
收藏
页码:719 / 724
页数:6
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