Field emission properties of two-layer structured SiCN films

被引：26
|
作者：
Tarntair, FG
Wu, JJ
Chen, KH
Wen, CY
Chen, LC
Cheng, HC [1 ]
机构：
[1] Natl Chiao Tung Univ, Dept Elect Engn, Hsinchu, Taiwan
[2] Natl Chiao Tung Univ, Inst Elect, Hsinchu, Taiwan
[3] Acad Sinica, Inst Atom & Mol Sci, Taipei 115, Taiwan
[4] Natl Taiwan Univ, Ctr Condensed Matter Sci, Taipei 10764, Taiwan
来源：
SURFACE & COATINGS TECHNOLOGY | 2001年 / 137卷 / 2-3期
关键词：
electron emission; SiCN; nanocrystalline; two-layer structure;
D O I：
10.1016/S0257-8972(00)01072-0
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The electron emission characteristics of two-layer structured silicon carbon nitride (SiCN) films, which were composed of amorphous and nanocrystalline phases, were studied. Rutherford backscattering spectroscopy (RBS) was used to determine the composition of the SiCN film. The ratio (Si;C)/N of the SiCN film was kept at approximately 0.75, which is identical to that of Si3N4 him. High resolution X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy were used to investigate the bonding structures of the SiCN films. In comparison with silicon nitride films, the turn-on Voltage (for an emission current of 0.01 mA/cm(2)) of the SiCN films was rower and the emission current densities of the SiCN significantly enhanced. The promising emission properties of the SiCN film could be due to the unique two-layer structure wherein nanocrystalline SiCN was grown on top of the amorphous interlayer with sp(2) CN bond in the SiCN film. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：152 / 157
页数：6
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