Defect states in Czochalski p-type silicon: the role of oxygen and dislocations

被引:5
|
作者
Castaldini, A
Cavalcoli, D
Cavallini, A
Pizzini, S
机构
[1] Univ Bologna, Dept Phys, I-40126 Bologna, Italy
[2] Univ Milano Bicocca, Dept Mat Sci, I-20125 Milan, Italy
关键词
D O I
10.1002/pssa.200460510
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This contribution reports the study, by junction spectroscopies, of electronic states induced by thermal and deformation treatments in p-type Si. In order to understand the role that oxygen precipitation, metallic contamination and plastic deformation play on the defect states, several sets of Cz (Czochalski) and Fz (Float-zone) Si samples and different material treatments were investigated. The electronic states were also compared with optical transitions obtained by photoluminescence analyses carried out on the same sample sets. These defect states could thus be microscopically identified with specific defect types. (c) 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:889 / 895
页数:7
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