Characterization of near-field optical microscope probes

被引：1
|
作者：
Klapetek, Petr [1 ]
Valtr, Miroslav [1 ]
Klenovsky, Petr [1 ,2 ]
Bursik, Jiri [3 ]
机构：
[1] Czech Metrol Inst, Brno 63800, Czech Republic
[2] Masaryk Univ, Fac Sci, CS-61137 Brno, Czech Republic
[3] CAS, Inst Phys Mat, Brno 61662, Czech Republic
来源：
SURFACE AND INTERFACE ANALYSIS | 2008年 / 40卷 / 3-4期
关键词：
near-field scanning optical microscopy; image artefacts; optical analysis;
D O I：
10.1002/sia.2784
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
In this article the far-field radiation analysis of near-field optical probes is presented. It is shown that the quality of probes used for near-field scanning microscopy imaging can be estimated using directional measurements of the far-field radiation patterns. Experimental results are compared with numerical modeling of far-field radiation performed using finite difference in time-domain method (FDTD) and with SEM characterization of real probe geometry. The effects of probe geometry on real measurement on different samples are studied as well. Copyright (c) 2008 John Wiley & Sons, Ltd.
引用
收藏
页码：482 / 485
页数：4
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