Time-resolved dynamics of 355-nm laser-irradiated surface damage on fused silica

被引：0
|
作者：
Xu, Shizhen [1 ,2 ]
Yuan, Xiaodong [1 ]
Zheng, Wanguo [1 ]
Zu, Xiaotao [2 ]
Lv, Haibin [1 ]
Jiang, Xiaodong [1 ]
机构：
[1] China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Peoples R China
[2] Univ Elect Sci & Technol China, Dept Appl Phys, Chengdu 610054, Peoples R China
来源：
ADVANCED OPTICAL MANUFACTURING TECHNOLOGIES, PTS 1 AND 2 | 2007年 / 6722卷
关键词：
UV laser; ablation; scattered light; time-resolved dynamics; fused silica;
D O I：
10.1117/12.782853
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The dynamics of 355-nm laser ablation on fused silica were studied by instantaneous scattering pulse measurement and a time-resolved shadowgraph imaging. The sharp increase of scattered light of pumped pulse is assumed to be the damage precursor, therefore, the damage start nearly at the peak of the pumped pulse. The plasmas flash due to ion-electron recombination occurred about 21ns after the peak of pumped pulses. The propagating shock wave and ejected material to the air were imaged by shadowgraphic technology. The damage process of fused silica under UV laser ablation was also discussed.
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页数：5
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