Study of microstructure and silicon segregation in cast iron using color etching and electron microprobe analysis

被引:25
|
作者
Vazehrad, S. [1 ]
Elfsberg, J. [2 ,3 ]
Dioszegi, A. [1 ]
机构
[1] Royal Inst Technol, Dept Mat Sci & Engn Casing Met, SE-10044 Stockholm, Sweden
[2] Scania CV AB, SE-15187 Sodertalje, Sweden
[3] Jonkoping Univ, Dept Mech Engn Mat & Mfg Foundry Technol, SE-55111 Jonkoping, Sweden
关键词
Cast iron; Color etching; Segregation; Electron microprobe analysis; Eutectic colony; SOLIDIFICATION;
D O I
10.1016/j.matchar.2014.09.008
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
An investigation on silicon segregation of lamellar, compacted and nodular graphite iron was carried out by applying a selective, immersion color etching and a modified electron microprobe to study the microstructure. The color etched micrographs of the investigated cast irons by revealing the austenite phase have provided data about the chronology and mechanism of microstructure formation. Moreover, electron microprobe has provided two dimensional segregation maps of silicon. A good agreement was found between the segregation profile of silicon in the color etched microstructure and the silicon maps achieved by electron microprobe analysis. However, quantitative silicon investigation was found to be more accurate than color etching results to study the size of the eutectic colonies. (C) 2014 Published by Elsevier Inc.
引用
收藏
页码:132 / 138
页数:7
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