Simulation Study on the Feasibility of Si as Material for Ultra-Scaled Nanowire Field-Effect Transistors

被引:0
|
作者
Stanojevic, Z. [1 ]
Baumgartner, O. [1 ]
Karner, M. [1 ]
Mitterbauer, F. [1 ]
Demel, H. [1 ]
Kernstock, C. [1 ]
机构
[1] Global TCAD Solut GmbH, Landhausgasse 4-1a, A-1010 Vienna, Austria
关键词
MOBILITY;
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暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present a simulation framework which allows thorough performance evaluation of ultra-scaled devices. Our simulation approach is based on the full solution of the Boltzmann transport equation (BTE) on subbands as calculated from a k.p-Hamiltonian and including all relevant scattering mechanisms which occur in semiconductors at room temperature. We employ the simulation framework to investigate the performance limits of silicon-based technology for ultra-scaled field-effect transistors in logic applications.
引用
收藏
页码:147 / 150
页数:4
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