Structural analysis of a Mo/Si EUV reflector by optical modeling

被引:4
|
作者
Kang, IY [1 ]
Chung, CY
Chung, YC
Kim, T
Lee, SY
Ahn, J
机构
[1] Hanyang Univ, Dept Ceram Engn, CPRC, Seoul 133791, South Korea
[2] Hanyang Univ, Dept Mat Sci & Engn, Seoul 133791, South Korea
关键词
EUVL; Mo/Si; multilayer; reflectivity;
D O I
10.3938/jkps.43.822
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The performance of a multilayer extreme ultraviolet (EUV) reflector has direct bearing on the process throughput and the cost of new technology. Using measured data from a real, manufactured reflector, we intended, in this work, to show that the reflectivity of the Bragg reflector can be factorized by using structural parameters such as the d-spacing, density, inter-diffusion layers, and oxidation layer. This quantitative analysis of the reflectivity derived from the structural parameters can be utilized to optimize the optical properties of the existing Mo/Si system and to provide fundamental insights into the science involved in a Bragg EUV reflector.
引用
收藏
页码:822 / 825
页数:4
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