Linear stability analysis of galvanostatic electrodeposition in the 2D diffusion-limited regime

被引:0
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作者
Elezgaray, J [1 ]
Leger, C [1 ]
Argoul, F [1 ]
机构
[1] Ctr Rech Paul Pascal, F-33600 Pessac, France
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中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The nature and the origin of the morphological instability which occurs in confined and unsupported electrodeposition experiments in galvanostatic regimes is discussed in terms of linear stability analysis, based on a theoretical work of Sundstrom and cell. (1). The originality of our approach resides on the direct confrontation of two dimensional experimental concentration maps obtained by phase shift interferometry with numerical simulations of the non stationary evolution equations. We demonstrate both experimentally and theoretically that a morphological transition occurs when the concentration of reducible species approaches zero. We point out the relevance of the electroneutrality hypothesis for predicting the interfacial instability with reference to a destabilization mechanism, based on the existence of a space charge, proposed by Chazalviel (2).
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页码:80 / 95
页数:16
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