Characterization of bulk GaN grown by sublimation technique

被引:7
|
作者
Naoi, Y [1 ]
Kobatake, K [1 ]
Kurai, S [1 ]
Nishino, K [1 ]
Sato, H [1 ]
Nozaki, M [1 ]
Sakai, S [1 ]
Shintani, Y [1 ]
机构
[1] Univ Tokushima, Dept Elect & Elect Engn, Tokushima 7708506, Japan
关键词
bulk; GaN; sublimation; SIMS; XRD;
D O I
10.1016/S0022-0248(98)00218-8
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We have characterized a bulk GaN grown by sublimation technique by means of the high resolution X-ray diffraction measurements: the secondary ion mass spectrometry measurements, the Raman spectroscopy measurements and the resistivity measurements. The results indicated that a bulk GaN was of relatively high purity with a very high crystal perfection. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:163 / 166
页数:4
相关论文
共 50 条
  • [21] Shape of SiC bulk single crystal grown by sublimation
    Nishizawa, S
    Kitou, Y
    Bahng, W
    Oyanagi, N
    Khan, MN
    Arai, K
    SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2, 2000, 338-3 : 99 - 102
  • [22] Shape of SiC bulk single crystal grown by sublimation
    Nishizawa, Shin-Ichi
    Kitou, Yasuo
    Bahng, Wook
    Oyanagi, Naoki
    Khan, Muhammad Nasir
    Arai, Kazuo
    Materials Science Forum, 2000, 338
  • [23] Experimental characterization of impact ionization coefficients for electrons and holes in GaN grown on bulk GaN substrates
    Cao, Lina
    Wang, Jingshan
    Harden, Galen
    Ye, Hansheng
    Stillwell, Roy
    Hoffman, Anthony J.
    Fay, Patrick
    APPLIED PHYSICS LETTERS, 2018, 112 (26)
  • [24] Bulk GaN crystals grown by HVPE
    Fujito, Kenji
    Kubo, Shuichi
    Nagaoka, Hirobumi
    Mochizuki, Tae
    Namita, Hideo
    Nagao, Satoru
    JOURNAL OF CRYSTAL GROWTH, 2009, 311 (10) : 3011 - 3014
  • [25] Sublimation growth of AlN and GaN bulk crystals on SiC seeds
    Mokhov, E. N.
    Wolfson, A. A.
    Helava, H.
    Makarov, Yu.
    SILICON CARBIDE AND RELATED MATERIALS 2012, 2013, 740-742 : 81 - +
  • [26] Lateral overgrowth of thick GaN on patterned GaN substrate by sublimation technique
    Wang, J.
    Tottori, S.
    Sato, H.
    Hao, M.-Sh.
    Ishikawa, Y.
    Sugahara, T.
    Yamashita, K.
    Sakai, Sh.
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1998, 37 (08): : 4475 - 4476
  • [27] Lateral overgrowth of thick GaN on patterned GaN substrate by sublimation technique
    Wang, J
    Tottori, S
    Sato, H
    Hao, MS
    Ishikawa, Y
    Sugahara, T
    Yamashita, K
    Sakai, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (08): : 4475 - 4476
  • [28] Structural characterization of bulk GaN crystals grown under high hydrostatic pressure
    LilientalWeber, Z
    Kisielowski, C
    Ruvimov, S
    Chen, Y
    Washburn, J
    Grzegory, I
    Bockowski, M
    Jun, J
    Porowski, S
    JOURNAL OF ELECTRONIC MATERIALS, 1996, 25 (09) : 1545 - 1550
  • [29] Characterization of bulk GaN crystals grown from solution at near atmospheric pressure
    Garces, N. Y.
    Feigelson, B. N.
    Freitas, J. A., Jr.
    Kim, Jihyun
    Myers-Ward, R.
    Glaser, E. R.
    JOURNAL OF CRYSTAL GROWTH, 2010, 312 (18) : 2558 - 2563
  • [30] Growth of GaN by sublimation technique and homoepitaxial growth by MOCVD
    Sakai, S
    Kurai, S
    Nishino, K
    Wada, K
    Sato, H
    Naoi, Y
    III-V NITRIDES, 1997, 449 : 15 - 22