Fabrication of homostructural ZnO p-n junctions and ohmic contacts to arsenic-doped p-type ZnO

被引:135
|
作者
Ryu, YR
Lee, TS
Leem, JH
White, HW
机构
[1] MOXtron Inc, Columbia, MO 65203 USA
[2] MOXTRONICS, Kwangju 500460, South Korea
[3] Univ Missouri, Dept Phys & Astron, Columbia, MO 65211 USA
关键词
D O I
10.1063/1.1625787
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report fabrication of homostructural ZnO p-n junctions that contain arsenic (As)-doped ZnO (ZnO:As) and intrinsic n-type ZnO layers. We also describe the metallization process for forming ohmic contacts to p-type ZnO. ZnO films were synthesized on n-type SiC substrates by hybrid beam deposition. Ni/Au metal contacts show linear I-V characteristics indicative of ohmic behavior, while other metal contacts (e.g., In/Au and Ti/Au) show nonlinear characteristics with rectification that reveal the presence of Schottky barriers. The characteristics for p-n junctions composed of ZnO layers are confirmed by I-V measurements. (C) 2003 American Institute of Physics.
引用
收藏
页码:4032 / 4034
页数:3
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