Monte-Carlo simulation of laser ablated plasma for thin film deposition

被引：21

作者：

Franklin, SR ^{[1
]}

Thareja, RK ^{[1
]}

机构：

[1] Indian Inst Technol, Dept Phys, Kanpur 208016, Uttar Pradesh, India

来源：

APPLIED SURFACE SCIENCE | 2001年 / 177卷 / 1-2期

关键词：

Monte-Carlo simulation; carbon plasma; thin films; laser produced plasma;

D O I：

10.1016/S0169-4332(01)00176-3

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Monte-Carlo (MC) simulation is employed to study the laser induced carbon plasma used for deposition of thin carbon films. The bifurcation of the laser ablated plume expanding in an ambient atmosphere in to fast and slow components is discussed. The dependence of the film profile on to a substrate on pressure of ambient gas and distance between the target and the substrate is presented. (C) 2001 Published by Elsevier Science B.V.

引用

页码：15 / 21

页数：7

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