Post-Fabrication Trimming of Silicon Photonic Ring Resonators at Wafer-Scale

被引:38
|
作者
Jayatilleka, Hasitha [1 ]
Frish, Harel [2 ]
Kumar, Ranjeet [1 ]
Heck, John [1 ]
Ma, Chaoxuan [1 ]
Sakib, Meer N. [1 ]
Huang, Duanni [1 ]
Rong, Haisheng [1 ]
机构
[1] Intel Corp, Santa Clara, CA 95054 USA
[2] Intel Corp, Rio Rancho, NM USA
关键词
Automatic tuning; fabrication variations; integrated optics; microring resonators; modulators; photonic device fabrication; post-fabrication trimming; silicon photonics; INTEGRATED-CIRCUITS; MODULATOR;
D O I
10.1109/JLT.2021.3079801
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Silicon ring resonator-based devices, such as modulators, detectors, filters, and switches, play important roles in integrated photonic circuits for optical communication, high-performance computing, and sensing applications. However, the high sensitivity to fabrication variations has limited their volume manufacturability and commercial adoption. Here, we report a low-cost post-fabrication trimming method to tune the resonance wavelength of a silicon ring resonator and correct for fabrication variations at wafer-scale. We use Ge implant to create an index trimmable section in the ring resonator and an on-chip heater to apply a precise and localized thermal annealing to tune and set its resonance to a desired wavelength. We demonstrate resonance wavelength trimming of ring resonators fabricated across a 300 mm silicon-on-insulator (SOI) wafer to within +/- 32 pm of a target wavelength of 1310 nm, providing a viable path to high-volume manufacturing and opening up new practical applications for these devices.
引用
收藏
页码:5083 / 5088
页数:6
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