Indium-induced Si(111)4x1 silicon substrate atom reconstruction

被引:26
|
作者
Saranin, AA
Khramtsova, EA
Ignatovich, KV
Lifshits, VG
Numata, T
Kubo, O
Katayama, M
Katayama, I
Oura, K
机构
[1] OSAKA UNIV,FAC ENGN,DEPT ELECT ENGN,SUITA,OSAKA 565,JAPAN
[2] OSAKA INST TECHNOL,FAC GEN EDUC,DEPT APPL PHYS,OSAKA 535,JAPAN
来源
PHYSICAL REVIEW B | 1997年 / 55卷 / 08期
关键词
D O I
10.1103/PhysRevB.55.5353
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Atomic hydrogen interaction with the Si(111)4 x 1-In surface phase was studied using low-energy electron diffraction, Anger electron spectroscopy, and scanning tunneling microscopy. Upon hydrogen action mostly Si-ln outer bonds are broken and are replaced by Si-H, and In is freed to form islands without Si movement. It was found that the underlying atomic layer of a substrate of the Si(111)4 x 1-In surfacephase has a reconstruction with the same periodicity as the In layer. A structural model of this substrate reconstruction is proposed, based on the recently proposed extended Pandey chain model for the Si(111)3 x 1 Ag- and alkali-metals-induced substrate reconstruction.
引用
收藏
页码:5353 / 5359
页数:7
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