Dependence of cluster ion emission from uranium oxide surfaces on the charge state of the incident slow highly charged ion

被引：0
|
作者：
Hamza, AV [1 ]
Schenkel, T [1 ]
Barnes, AV [1 ]
机构：
[1] Univ Calif Lawrence Livermore Natl Lab, Livermore, CA 94551 USA
来源：
EUROPEAN PHYSICAL JOURNAL D | 1999年 / 6卷 / 01期
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D O I：
暂无
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The cluster ion yields and cluster ion distribution for highly charged ion sputtering have been measured for a uranium oxide target for Xe44+, Au-63,Au-66,Au-69+ and Th75+ incident ions. The cluster yields exhibit a power lan dependence on the cluster size with exponents increasing from -4 to -2.4 with increasing primary ion charge from 44+ to 75+. The power law exponent is also correlated with the total sputter yield.
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页码：83 / 87
页数：5
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