Zinc oxide films deposited on FTO substrate by hydrothermal microwave-assisted method

This study aimed to prepare nanostructured ZnO films deposited on FTO substrate by microwave-hydrothermal method. The effects of synthesis time and post-synthesis heat treatment were assessed. ZnO films exhibited a wurtzite structure and a band gap in the range of 3.2 to 3.4 eV. Microwave time influenced film morphology, which varied from lamellar structures (10 min of microwave exposure) to spherical particles (30 min of microwave exposure). Post-synthesis heat treatment removed synthesis residues, increasing film purity and resulting in spherical particles with porous surfaces. These characteristics enhanced the photocatalytic properties of films for degradation of rhodamine B. The findings of this study underscore the importance of microwave conditions in the synthesis of ZnO films with semiconductor properties.