The effect of oxygen on the inhibition of copper corrosion with benzotriazole

被引：28
|
作者：
Mansikkamäki, K [1 ]
Johans, C [1 ]
Kontturi, K [1 ]
机构：
[1] Aalto Univ, Phys Chem & Electrochem Lab, FIN-02015 Helsinki, Finland
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 2006年 / 153卷 / 01期
关键词：
D O I：
10.1149/1.2130569
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
The inhibition of copper corrosion by benzotriazole (BTAH) has been studied by scanning electrochemical microscopy as a function of time and oxygen content. Under normal atmospheric conditions the inhibiting [Cu(I)-BTA] film was formed in approximately 1 h. When the oxygen content was lowered below 15 ppm, an insulating film could not be obtained in 4 h, clearly showing that the formation of the inhibiting [Cu(I)-BTA] requires oxygen. (c) 2005 The Electrochemical Society.
引用
收藏
页码：B22 / B24
页数：3
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