Site selective excitation of Er-implanted GaN

被引:5
|
作者
Przybylinska, H
Jantsch, W
Kozanecki, A
机构
[1] Johannes Kepler Univ, Inst Halbleiter & Festkorperphys, A-4040 Linz, Austria
[2] Polish Acad Sci, Inst Phys, PL-02668 Warsaw, Poland
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 2001年 / 81卷 / 1-3期
关键词
erbium; GaN; photoluminescence; 1.5 mu m emission;
D O I
10.1016/S0921-5107(00)00703-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The photoluminescence (PL), and PL excitation studies of Er-implanted GaN reveal a variety of Er centers with different excitation mechanisms. The PL of the centers dominating under above band-gap illumination is mediated primarily by donor-acceptor pair recombination, and subject to temperature quenching. Evidence is found for significant energy migration among Er centers dominating under direct excitation into the 4f-shell, which leads to a stronger quenching. The PL intensity of centers excited by a broad, below-gap absorption band, associated with deep traps is temperature independent. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:147 / 149
页数:3
相关论文
共 50 条
  • [41] INVESTIGATION OF CRYSTALLIZATION INCORPORATION OF ER-IMPLANTED SILICON
    WAN, Y
    LI, DQ
    ZHANG, B
    CHEN, KJ
    ZHU, PR
    XU, TB
    JOURNAL OF RARE EARTHS, 1995, 13 (02) : 109 - 113
  • [42] Photoluminescence of Er-implanted KTP and RTP crystals
    Kling, A
    Rico, M
    Zaldo, C
    Aguiló, M
    Díaz, F
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2004, 218 : 271 - 276
  • [43] Structural and optical characterisation of Er-implanted silicon
    Huda, MQ
    Taskin, T
    Evans, JH
    Peaker, AR
    Liu, P
    Zhang, JP
    Curello, G
    Wilson, RJ
    Jafri, ZH
    Rao, SS
    Hemment, PLF
    MICROSCOPY OF SEMICONDUCTING MATERIALS 1995, 1995, 146 : 461 - 464
  • [44] Optically active centers in er-implanted silicon
    Przybylinska, H.
    Jantsch, W.
    Hendorfer, G.
    Palmetshofer, L.
    Wilson, R.J.
    Sealy, B.J.
    Acta Physica Polonica A, 1995, 88 (5 pt 1)
  • [45] Nonlinear properties of Er-implanted opal structure
    Ajgaonkar, M.
    Zhang, Y.
    Grebel, H.
    Sosnowski, M.
    Jacobson, D.
    Conference on Quantum Electronics and Laser Science (QELS) - Technical Digest Series, 2000,
  • [46] Upconversion luminescence of Er-implanted GaN films by focused-ion-beam direct write
    Chao, LC
    Lee, BK
    Chi, CJ
    Cheng, J
    Chyr, I
    Steckl, AJ
    APPLIED PHYSICS LETTERS, 1999, 75 (13) : 1833 - 1835
  • [47] Site-selective spectroscopy of Er in GaN
    Dierolf, V. (vod2@lehigh.edu), 1600, American Institute of Physics Inc. (95):
  • [48] Site-selective spectroscopy of Er in GaN
    Dierolf, V
    Sandmann, C
    Zavada, J
    Chow, P
    Hertog, B
    JOURNAL OF APPLIED PHYSICS, 2004, 95 (10) : 5464 - 5470
  • [49] THE ROLE OF HYDROGEN IN Er-IMPLANTED a-SiOx:H
    C.Y. Chen
    W.D. Chen
    Y.Q. Wang
    J.J. Liang
    Z.G. Xu
    Acta Metallurgica Sinica(English Edition), 2002, (01) : 87 - 90
  • [50] Extended x-ray absorption fine structure and photoluminescence study of Er-implanted GaN films
    Wruck, D
    Lorenz, K
    Vianden, R
    Reinhold, B
    Mahnke, HE
    Baranowski, JM
    Pakula, K
    Parthier, L
    Henneberger, F
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2001, 16 (11) : L77 - L80