Solvent response of polymers for micromachine manipulation

被引：34
|
作者：
Tian, Ye [1 ]
Zhang, Yong-Lai [1 ]
Xia, Hong [1 ]
Guo, Li [1 ]
Ku, Jin-Feng [1 ]
He, Yan [1 ]
Zhang, Ran [1 ]
Xu, Bin-Zong [1 ]
Chen, Qi-Dai [1 ]
Sun, Hong-Bo [1 ,2 ]
机构：
[1] Jilin Univ, Coll Elect Sci & Engn, State Key Lab Integrated Optoelect, Changchun 130012, Peoples R China
[2] Jilin Univ, Coll Phys, Changchun 130012, Peoples R China
来源：
PHYSICAL CHEMISTRY CHEMICAL PHYSICS | 2011年 / 13卷 / 11期
关键词：
D O I：
10.1039/c0cp02006k
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
A novel solvent responsive polymer micromachine has been successfully fabricated by two-photon photopolymerization (TPP) of methacrylate-based photoresists. The moving part of the micromachine could be easily driven by interfacial solvent polarity induced swelling and shrinking of the photopolymer networks. Furthermore, the driving performance of the micromachine could be precisely modulated by varying the laser scanning step length during fabrication.
引用
收藏
页码：4835 / 4838
页数：4
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