Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography

被引：20

作者：

Xue, Chaofan ^{[1
]}

Zhao, Jun ^{[1
]}

Wu, Yanqing ^{[1
]}

Yu, Huaina ^{[1
]}

Yang, Shumin ^{[1
]}

Wang, Liansheng ^{[1
]}

Zhao, Wencong ^{[1
]}

Wu, Qiang ^{[2
]}

Zhu, Zhichao ^{[2
]}

Liu, Bo ^{[2
]}

Zhang, Xia ^{[3
]}

Zhou, Wenchao ^{[4
]}

Tai, Renzhong ^{[1
]}

机构：

[1] Chinese Acad Sci, Shanghai Synchrotron Radiat Facil, Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China

[2] Tongji Univ, Sch Phys Sci & Engn, Shanghai Key Lab Special Artificial Microstruct M, Shanghai 200092, Peoples R China

[3] Qufu Normal Univ, Shandong Prov Key Lab Laser Polarizat & Informat, Qufu 273165, Peoples R China

[4] Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Appl Opt, Changchun 130033, Jilin, Peoples R China

来源：

APPLIED SURFACE SCIENCE | 2017年 / 425卷

基金：

中国国家自然科学基金;

关键词：

Synchrotron radiation; Soft X-ray interference lithography; Large-area high-aspect-ratio nano periodic arrays; Photonic crystals; EXTREME-ULTRAVIOLET; RESOLUTION; ARRAYS; LIGHT;

D O I：

10.1016/j.apsusc.2017.07.010

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Periodic nanostructures have attracted considerable interest and been applied in many fields. However, nanostructures of sufficiently large areas and depths are necessary for the development of practical devices. In this study, large-area high-aspect-ratio periodic nanostructures were fabricated by using a hybrid technology based on X-ray interference lithography, and then the patterns were transferred onto various substrates successfully. The final periodic nanostructures on the substrate attained measurements up to square centimetres with depths greater than 200 nm. (C) 2017 Elsevier B.V. All rights reserved.

引用

页码：553 / 557

页数：5

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