Island distance in one-dimensional epitaxial growth

被引：20

作者：

Kallabis, H ^{[1
]}

Krapivsky, PL

Wolf, DE

机构：

[1] Univ Duisburg Gesamthsch, FB 10, D-47048 Duisburg, Germany

[2] Boston Univ, Ctr Polymer Studies, Boston, MA 02215 USA

来源：

EUROPEAN PHYSICAL JOURNAL B | 1998年 / 5卷 / 03期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1007/s100510050505

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

The typical island distance l in submonolayer epitaxial growth depends on the growth conditions via an exponent gamma. This exponent is known to depend on the substrate dimensionality, the dimension of the islands, and the size i* of the critical nucleus for island formation. In this paper we study the dependence of gamma on i* in one-dimensional epitaxial growth. We derive that gamma = i*/(2i* + 3) for i* greater than or equal to 2 and confirm this result by computer simulations.

引用

页码：801 / 804

页数：4

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