Electron-phonon interaction studies in an In0.52Al0.48As/In0.53Ga0.47As/In0.52Al0.48As quantum well structure

被引:6
|
作者
Prasad, C
Ferry, DK
Vasileska, D
Wieder, HH
机构
[1] Arizona State Univ, Dept Elect Engn, Tempe, AZ 85287 USA
[2] Arizona State Univ, Ctr Solid State Elect Res, Tempe, AZ 85287 USA
[3] Univ Calif San Diego, Dept Elect & Comp Engn, La Jolla, CA 92093 USA
来源
关键词
hot carriers; energy relaxation; joule heating; InAlAs; InGaAs;
D O I
10.1016/S1386-9477(03)00319-9
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Joule heating measurements are carried out over a wide range of temperatures on a two-dimensional electron gas fabricated in an In0.52Al0.48As/In0.53Ga0.47As/In0.52Al0.48As heterostructure system that has a 25 nm wide In0.53Ga0.47As quantum well region. The energy loss rate is observed to be an indicator of the electron-phonon coupling processes in these systems. The temperature dependence of the energy loss rate is studied from 30 mK to 30 K and points toward a possible dominant unscreened piezoelectric coupling to the acoustic modes over temperatures of 1-30 K, with boundary scattering in the ohmic contacts gaining importance at very low temperatures. The temperature decay of the energy relaxation time exhibits a T-3 behavior at high temperatures that transitions to a T at lower temperatures and tends to saturation at millikelvin levels. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:215 / 220
页数:6
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