Electrochemical deposition and characterization of Ni-P alloy thin films

被引:38
|
作者
Mahalingam, T. [1 ]
Raja, M.
Thanikaikarasan, S.
Sanjeeviraja, C.
Velumani, S.
Moon, Hosun
Kim, Yong Deak
机构
[1] Alagappa Univ, Dept Phys, Karaikkudi 630003, Tamil Nadu, India
[2] Dept Fis, Monterrey 64849, Nuevo Leon, Mexico
[3] Ajou Univ, Coll Informat Technol, Dept Elect & Comp Engn, Suwon 443749, South Korea
关键词
Electrodeposition; Ni-P alloy; thin films; structural studies;
D O I
10.1016/j.matchar.2006.11.023
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Nickel phosphorus (Ni-P) alloy thin films were prepared by electrodeposition on pre-cleaned copper substrates using a potentiostatic cathodic electrodeposition method from sulfate electrolyte baths at various sodium hypophosphite (NaH2PO2) concentrations. X-ray diffraction studies reveal polycrystalline cubic alloys at low concentrations of phosphorus (< 13.5 at.%) and these transformed into amorphous alloys at higher concentrations. X-ray photoelectron spectra show the presence of Ni(2)p and P2p lines corresponding to their binding energies. Scanning electron microscopic studies reveal spherical shaped grains at low phosphorus contents and modules of cauliflower type morphology at higher phosphorus concentrations. The effects of phosphorus concentration on the crystal structure, composition and morphology are studied and discussed. (C) 2006 Elsevier Inc. All rights reserved.
引用
收藏
页码:800 / 804
页数:5
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