Third-order nonlinearity in silicon beyond 2350 nm

被引:31
|
作者
Gholami, Faezeh [1 ]
Zlatanovic, Sanja [1 ]
Simic, Aleksandar [1 ]
Liu, Lan [1 ]
Borlaug, David [1 ]
Alic, Nikola [1 ]
Nezhad, Maziar P. [1 ]
Fainman, Yeshaiahu [1 ]
Radic, Stojan [1 ]
机构
[1] Univ Calif San Diego, Dept Elect & Comp Engn, La Jolla, CA 92093 USA
关键词
WAVE-GUIDES; RAMAN AMPLIFICATION; 2-PHOTON ABSORPTION; SEMICONDUCTORS;
D O I
10.1063/1.3630130
中图分类号
O59 [应用物理学];
学科分类号
摘要
Measurement of the Kerr nonlinearity in silicon is reported in the 2350 nm to 2750 nm wavelength range, where three-photon absorption effect is present. The measurements confirm that the Kerr interaction strength is comparable to that in the near-infrared. The measured dispersion trend for the Kerr coefficient is consistent with that obtained using Kramers-Kronig relations. Three-photon absorption was measured, and its effect on the nonlinear figure of merit in silicon appears not to be as restrictive as that of two-photon absorption. The results identify silicon as a promising platform for parametric processes in mid-infrared spectral region. (C) 2011 American Institute of Physics. [doi:10.1063/1.3630130]
引用
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页数:3
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