Structure of a thin oxide film on Rh(100) -: art. no. 115442

被引：95
|
作者：
Gustafson, J
Mikkelsen, A
Borg, M
Andersen, JN
Lundgren, E
Klein, C
Hofer, W
Schmid, M
Varga, P
Köhler, L
Kresse, G
Kasper, N
Stierle, A
Dosch, H
机构：
[1] Lund Univ, Dept Synchrotron Radiat Res, S-22100 Lund, Sweden
[2] Vienna Univ Technol, Inst Allgemeine Phys, A-1040 Vienna, Austria
[3] Univ Vienna, Inst Mat Phys, A-1090 Vienna, Austria
[4] Max Planck Inst Met Res, D-70569 Stuttgart, Germany
来源：
PHYSICAL REVIEW B | 2005年 / 71卷 / 11期
关键词：
D O I：
10.1103/PhysRevB.71.115442
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The initial oxidation of Rh(100) has been studied using high resolution core level spectroscopy, low energy electron diffraction, surface x-ray diffraction, scanning tunneling microscopy, and density functional theory. We report a structural study of an oxygen induced structure displaying a c(8x2) periodicity at an oxygen pressure above 10(-5) mbar and using a sample temperature of 700 K. Our experimental and theoretical data demonstrate that this structure is due to the formation of a thin surface oxide with a hexagonal trilayer O-Rh-O structure.
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页数：9
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