Structure and mechanical properties of nanostructured metal-carbon films

被引：0
|
作者：
Pauleau, Y [1 ]
Thiery, F [1 ]
Pelletier, J [1 ]
Uglov, VV [1 ]
Kuleshov, AK [1 ]
Dub, SN [1 ]
Samtsov, MP [1 ]
机构：
[1] CNRS, LEMD, Grenoble, France
来源：
NANOSTRUCTURED MATERIALS AND COATINGS FOR BIOMEDICAL AND SENSOR APPLICATIONS | 2003年 / 102卷
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D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Nanocrystalline copper/hydrogenated amorphous carbon (nc-Cu/a-C:H) films have been deposited on Si substrates by a microwave plasma-enhanced chemical vapor deposition process combined with a sputter deposition process. The deposition rate of films was found to vary in the range of 15 to 25 nm/min depending on the composition of argon-methane mixtures. These films were analyzed by Rutherford backscattering spectroscopy and Raman spectroscopy. The crystallographic structure, nanohardness, and friction coefficient of films were investigated as functions of the carbon content.
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页码：175 / 180
页数：6
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