Comparative Evaluation of Spin-Transfer-Torque and Magnetoelectric Random Access Memory

被引:71
|
作者
Wang, Shaodi [1 ]
Lee, Hochul [1 ]
Ebrahimi, Farbod [1 ,2 ]
Amiri, P. Khalili [1 ,2 ]
Wang, Kang L. [1 ]
Gupta, Puneet [1 ]
机构
[1] Univ Calif Los Angeles, Dept Elect Engn, Los Angeles, CA 90095 USA
[2] Inston Inc, Los Angeles, CA 90095 USA
基金
美国国家科学基金会;
关键词
Evaluation; magnetic tunnel junctions (MTJ); magnetoelectric random access memory (MeRAM); spin-transfer torque RAM (STT-RAM); voltage controled memory; write energy; write error rate; write speed; MAGNETIC TUNNEL-JUNCTIONS; CIRCUIT-LEVEL EVALUATOR; STT MRAM ARRAY; STATISTICAL DESIGN; OPTIMIZATION; CELL; PERFORMANCE; EXCITATION; PROCEED; LAYERS;
D O I
10.1109/JETCAS.2016.2547681
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Spin-transfer torque random access memory (STT-RAM), as a promising nonvolatile memory technology, faces challenges of high write energy and low density. The recently developed magnetoelectric random access memory (MeRAM) enables the possibility of overcoming these challenges by the use of voltage-controlled magnetic anisotropy (VCMA) effect and achieves high density, fast speed, and low energy simultaneously. As both STT-RAM and MeRAM suffer from the reliability problem of write errors, we implement a fast Landau-Lif-shitz- Gilbert equation-based simulator to capture their write error rate (WER) under process and temperature variation. We utilize a multi-write peripheral circuit to minimize WER and design reliable STT-RAM and MeRAM. With the same acceptable WER, MeRAM shows advantages of 83% faster write speed, 67.4% less write energy, 138% faster read speed, and 28.2% less read energy compared with STT-RAM. Benefiting from the VCMA effect, MeRAM also achieves twice the density of STT-RAM with a 32 nm technology node, and this density difference is expected to increase with technology scaling down.
引用
收藏
页码:134 / 145
页数:12
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