Effect of temperature on the growth of vanadium oxide films deposited by DC reactive magnetron sputtering

被引：0
|
作者：
Du, Mingjun [1 ]
Wu, Zhiming [1 ]
Luo, Zhenfei [1 ]
Xu, Xiangdong [1 ]
Yu, Junsheng [1 ]
Jiang, Yadong [1 ]
机构：
[1] Univ Elect Sci & Technol China, Sch Optoelect Informat, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R China
来源：
5TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: OPTOELECTRONIC MATERIALS AND DEVICES FOR DETECTOR, IMAGER, DISPLAY, AND ENERGY CONVERSION TECHNOLOGY | 2010年 / 7658卷
关键词：
vanadium oxide; magnetron sputtering; deposition temperature; V2O5; VO2;
D O I：
10.1117/12.865558
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Vanadium oxide films were prepared onto glass and KBr substrates at various deposition temperatures by DC reactive magnetron sputtering. X-Ray photoelectron spectroscopy (XPS), Atomic force microscope (AFM), Fourier transform infrared spectroscopy (FT-IR) were employed to analyze the Vox films, respectively. Experimental results indicated that deposition temperature has a great impact on the surface morphology of vanadium oxide films. The XPS analysis confirmed that the vanadium oxide films prepared are V2O5. From Fourier transform infrared spectroscopy, it can be see that the infrared active mode corresponding to V-O-V stretching vibration and the stretching vibration of unshared V=O bonds appeared at about 840 cm(-1) and 915 cm(-1) in the films formed at 240 degrees C, respectively. A shift in the pack position towards higher frequency was found with increasing the deposition temperature which indicated that the films formed at higher deposition temperature were structural disorder.
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页数：6
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