Patterning dewetting in thin polymer films by spatially directed photocrosslinking

被引:30
|
作者
Carroll, Gregory T. [1 ]
Turro, Nicholas J. [1 ,2 ]
Koberstein, Jeffrey T. [2 ]
机构
[1] Columbia Univ, Dept Chem, New York, NY 10027 USA
[2] Columbia Univ, Dept Chem Engn, New York, NY 10027 USA
基金
美国国家科学基金会;
关键词
Dewetting; Patterning; Photocrosslinking; Thin films; WATER-REPELLENT; SURFACES; MICROCHANNELS; MORPHOLOGY; ARRAYS;
D O I
10.1016/j.jcis.2010.07.070
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In this report we examine the dewetting of spin-cast poly (styrene) films in a confined geometry. We designed a platform for laterally confining PS by photo-patterning crosslinks in spin-coated thin films. Heating the patterned film above the glass transition temperature of PS results in localized dewetting patterns in regions that were not crosslinked, while the crosslinked pattern serves as a rigid barrier that confines the retraction of the uncrosslinked polymer in micron-sized domains. The barriers also provide a favorable surface that the liquid PS wets onto, forming a rim at the boundary of crosslinked and uncrosslinked polymer. The resulting patterns are shown to be dependent on the irradiation and annealing time, the dimensions of the uncrosslinked region and the thickness of the film. (C) 2010 Elsevier Inc. All rights reserved.
引用
收藏
页码:556 / 560
页数:5
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