Temporal characteristics of net excitation rates in inductively coupled plasma in Ar and CF4 by one-dimensional relaxation continuum modeling

被引：4
|
作者：
Hou, K [1 ]
Nakagarni, S [1 ]
Makabe, T [1 ]
机构：
[1] Keio Univ, Fac Sci & Technol, Yokohama, Kanagawa 2238522, Japan
来源：
THIN SOLID FILMS | 2001年 / 386卷 / 02期
关键词：
ICP; RCT-model; CF4; plasma;
D O I：
10.1016/S0040-6090(00)01649-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Plasma structure in an inductively coupled plasma reactor is numerically investigated in electropositive Ar and electronegative CF4 under the lowest sustaining condition. In the case of Ar, the discharge is maintained under the influence of an azimuthal electric field, whilst the CF4 plasma is electrostatically sustained by a radial field under the presence of negative ions F-. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：239 / 242
页数：4
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