Paramagnetic states in μc-SiC:H thin films prepared by Hot-Wire CVD at low temperatures

被引:4
|
作者
Xiao, Lihong [1 ]
Astakhov, Oleksandr [1 ]
Carius, Reinhard [1 ]
Chen, Tao [1 ,2 ]
Wang, Haiyan [1 ,3 ]
Stutzmann, Martin [4 ]
Finger, Friedhelm [1 ]
机构
[1] Forschungszentrum Julich, IEF Photovolta 5, D-52425 Julich, Germany
[2] Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Zhejiang, Peoples R China
[3] Zhengzhou Univ, Sch Phys Engn, Zhengzhou 450052, Henan, Peoples R China
[4] Tech Univ Munich, Walter Schottky Inst, D-85435 Garching, Germany
关键词
NANOCRYSTALLINE SILICON-CARBIDE; HWCVD;
D O I
10.1002/pssc.200982871
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The relationship between the structure, electrical conductivity and paramagnetic states in microcrystalline hydrogenated silicon carbide (mu c-SiC:H) prepared by HWCVD is investigated. The study includes undoped and Al-doped (p-type) mu c-SiC:H of different crystalline volume fraction (I-C(IR)). High densities of paramagnetic states are observed in undoped material over a wide range of crystallinity whereas the conductivity increases by 10 orders of magnitude up to 10(-2) S/cm as the material becomes more crystalline. This dramatic increase of the conductivity attributed to unintentional n-type doping has a clear effect on the ESR spectrum which changes from a broad featureless resonance in the low crystallinity material to a sharp line with a pair of distinct satellites in highly crystalline n-type mu c-SiC:H. Al-doping results in compensation and then effective p-type doping in mu c-SiC:H at higher doping concentration. Al-doping seems to hinder the crystalline growth in p-type mu c-SiC:H. For I-C(IR) <= 20% the spin resonance signature is a broad (peak-to-peak linewidth Delta H-pp approximate to 30 G) featureless slightly asymmetric line at g approximate to 2.01. The nature and behavior of the ESR spectra in different types of mu c-SiC:H are investigated with respect to the Fermi level position and crystalline volume fraction. (C) 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:778 / 781
页数:4
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