High-Voltage CMOS Active Pixel Sensor

被引:21
|
作者
Peric, Ivan [1 ]
Andreazza, Attilio [2 ,3 ]
Augustin, Heiko [4 ]
Barbero, Marlon [5 ]
Benoit, Mathieu [6 ,7 ]
Casanova, Raimon [8 ]
Ehrler, Felix [1 ]
Iacobucci, Giuseppe [6 ]
Leys, Richard [1 ]
Gonzalez, Annie Meneses [4 ]
Pangaud, Patrick [5 ]
Prathapan, Mridula [1 ,9 ]
Schimassek, Rudolf [1 ]
Schoening, Andre [4 ]
Figueras, Eva Vilella [10 ]
Weber, Alena [4 ]
Weber, Michele [11 ]
Wong, Winnie [12 ]
Zhang, Hui [1 ]
机构
[1] Karlsruhe Inst Technol KIT, Inst Data Proc & Elect IPE, D-76131 Karlsruhe, Germany
[2] Univ Milan, Dipartimento Fis, I-20133 Milan, Italy
[3] Ist Nazl Fis Nucl, I-20133 Milan, Italy
[4] Heidelberg Univ, Phys Inst, Heidelberg, Germany
[5] Aix Marseille Univ, CPPM, CNRS, IN2P3, F-13288 Marseille, France
[6] Univ Geneva, Dept Nucl & Particle Phys DPNC, CH-1205 Geneva, Switzerland
[7] Brookhaven Natl Lab, New York, NY 11973 USA
[8] Inst Fis Altes Energies IFAE, Barcelona 08193, Spain
[9] IBM Res Zurich, CH-8803 Ruschlikon, Switzerland
[10] Univ Liverpool, Dept Phys, Liverpool L69 7ZE, Merseyside, England
[11] Univ Bern, Lab High Energy Phys LHEP, CH-3012 Bern, Switzerland
[12] Mercury Syst, CH-1212 Lancy, Switzerland
关键词
Active pixel sensors; ionizing radiation sensors; particle beam measurements; particle tracking; position-sensitive; ATLAS; MAPS; TECHNOLOGIES; DETECTORS;
D O I
10.1109/JSSC.2021.3061760
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The high-voltage CMOS (HVCMOS) sensors are a novel type of CMOS active pixel sensors for ionizing particles that can be implemented in CMOS processes with deep n-well option. The pixel contains one sensor electrode formed with a deep n-well implanted in a p-type substrate. CMOS pixel electronics, embedded in shallow wells, are placed inside the deep n-well. By biasing the substrate with a high negative voltage and by the use of a lowly doped substrate, a depleted region depth of at least 30 mu m can be achieved. The electrons generated by a particle are collected by drift, which induces fast detectable signals. This publication presents a 4.2-cm(2) large HVCMOS pixel sensor implemented in a commercial 180-nm process on a lowly doped substrate and its characterization.
引用
收藏
页码:2488 / 2502
页数:15
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