Inductively coupled plasma etching of GaN

被引：189

作者：

Shul, RJ

McClellan, GB

Casalnuovo, SA

Rieger, DJ

Pearton, SJ

Constantine, C

Barratt, C

Karlicek, RF

Tran, C

Schurman, M

机构：

[1] UNIV FLORIDA,DEPT MAT SCI & ENGN,GAINESVILLE,FL 32611

[2] PLASMA THERM INC,ST PETERSBURG,FL 33716

[3] EMCORE CORP,SOMERSET,NJ 08873

来源：

APPLIED PHYSICS LETTERS | 1996年 / 69卷 / 08期

关键词：

D O I：

10.1063/1.117077

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Inductively coupled plasma (ICP) etch rates for GaN are reported as a function of plasma pressure, plasma chemistry, rf power, and ICP power. Using a Cl-2/H-2/Ar plasma chemistry, GaN etch rates as high as 6875 Angstrom/min are reported. The GaN surface morphology remains smooth over a wide range of plasma conditions as quantified using atomic force microscopy. Several etch conditions yield highly anisotropic profiles with smooth sidewalls. These results have direct application to the fabrication of group-III nitride etched laser facets. (C) 1996 American Institute of Physics.

引用

页码：1119 / 1121

页数：3

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