Scaled LTPS TFTs for Low-Cost Low-Power Applications

被引:0
|
作者
Kim, Soo Youn [1 ]
Baytok, Selin [1 ]
Roy, Kaushik [1 ]
机构
[1] Purdue Univ, W Lafayette, IN 47907 USA
关键词
BOX (buried oxide); Buried-oxide Induced Barrier Lowering (BIBL); Drain Induced Barrier Lowering (DIBL); Thin Film Transistor (TFT); THIN; VOLTAGE; SOI;
D O I
暂无
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
Low-temperature polycrystalline-silicon thin-film transistors (LTPS TFTs) have emerged as a promising technology for applications such as low-cost sensor networks. In this paper, we propose a LTPS TFT device optimization methodology based on scaling of silicon body (T-si) and buried oxide thickness (T-box). The proposed approach is applicable for both digital and analog circuits. Results show that using the proposed device we can achieve 133X improvement in oscillation frequency of a three-stage ring oscillator (RO) and 31% improvement in operational amplifier (OPAMP) gain (T-si = 10nm and T-box = 10nm) compared to the traditional device structures. We believe that proper optimization of TFT device geometry parameters is necessary to realize low-power, high-performance, and low-cost LTPTS TFT digital & analog/RF circuits.
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页码:745 / 750
页数:6
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