Subsurface defect of the SiOx film imaged by atomic force acoustic microscopy

被引:7
|
作者
He Cunfu [1 ]
Zhang Gaimei [1 ]
Wu Bin [1 ]
Wu Zaiqi [1 ]
机构
[1] Beijing Univ Technol, Coll Mech Engn & Appl Elect Technol, Beijing 100124, Peoples R China
基金
中国国家自然科学基金;
关键词
SiOx film; Acoustic amplitude image; Atomic force acoustic microscopy; Local elasticity; Subsurface defect; ELASTIC PROPERTIES; BARRIER FILMS; DEPOSITION; COATINGS;
D O I
10.1016/j.optlaseng.2009.12.014
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Atomic force acoustic microscopy (AFAM) has been developed in order to evaluate mechanical properties of the materials at nano-scale. The SiOx films on the silicon wafer and glass slide were prepared by plasma enhanced chemical vapor deposition (PECVD) and their properties were characterized by atomic force acoustic microscopy (AFAM). The images of the amplitude of the vibrating cantilever were visualized for the sample vibrating at the ultrasonic frequency and the characteristics of the images were also discussed at the different excitation frequencies The results showed that the acoustic amplitude images can provide information about the local elasticity and the subsurface defects of the materials qualitatively (C) 2010 Published by Elsevier Ltd
引用
收藏
页码:1108 / 1112
页数:5
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