Compositional uniformity in sputter-deposited NiTi shape memory alloy thin films

被引：19
|
作者：
Mohanchandra, K. P. [1 ]
Ho, Ken K. [2 ]
Carman, Greg P. [1 ]
机构：
[1] Univ Calif Los Angeles, Dept Mech & Aerosp Engn, Los Angeles, CA 90095 USA
[2] Fortis Technol Inc, Los Angeles, CA 90064 USA
来源：
MATERIALS LETTERS | 2008年 / 62卷 / 20期
关键词：
shape memory materials; thin films;
D O I：
10.1016/j.matlet.2008.03.028
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Compositional uniformity in NiTi thin films produced under "cold" and "hot" target conditions using d. c. magnetron sputtering is presented in this article. Film deposited under "hot" target condition shows significantly better compositional uniformity compared to those deposited under "cold" target condition. The Ti composition in the film produced under "cold" target condition showed a 2.5 at.% loss relative to the target composition, whereas film produced under "hot" target condition exhibits composition nearly identical to that of the target. XRD and DSC measurements confirm the presence of martensitic phase at room temperature and the shape memory effect in the film deposited under "hot" target condition. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码：3481 / 3483
页数：3
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