Epitaxial growth of hcp/fcc Co bilayer films on Al2O3(0001) substrates

被引：19
|
作者：
Ohtake, Mitsuru [1 ]
Futamoto, Masaaki [1 ]
Kirino, Fumiyoshi [2 ]
Fujita, Norihito [3 ]
Inaba, Nobuyuki [3 ]
机构：
[1] Chuo Univ, Fac Sci & Engn, Bunkyo Ku, Tokyo 1128551, Japan
[2] Tokyo Natl Univ Fine Arts & Music, Taito Ku, Grad Sch Fine Arts, Tokyo 1108714, Japan
[3] Yamagata Univ, Dept Elect & Elect Engn, Yonezawa, Yamagata 9928510, Japan
来源：
JOURNAL OF APPLIED PHYSICS | 2008年 / 103卷 / 07期
关键词：
D O I：
10.1063/1.2838848
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Co magnetic bilayer films with different stacking structures of fcc/hcp and hcp/fcc were successfully prepared on Al2O3(0001) substrates employing Au and Cu underlayers. The structure and the magnetic properties of these bilayer films were investigated. The crystal structure and the strain of Co layers are influenced by the underlayer. Q-band ferromagnetic resonance analysis has shown that the Co bilayer films consist magnetically of fcc and hcp phases. It has been shown possible to prepare hcp/fcc Co epitaxial magnetic bilayer films that can be used for patterned media applications.
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页数：3
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