Preparation, characterization, and heat resistance studies of a holographic photopolymer based on SU-8 epoxy resin

被引：3
|
作者：
Takamatsu, Yasushi [1 ,2 ,3 ]
Dunmeyer, David [1 ]
Thomas, Edwin L. [2 ]
Warde, Cardinal [1 ]
机构：
[1] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA
[2] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
[3] Mitsui Chem Inc, Mat Sci Lab, Sodegaura, Chiba 2990265, Japan
来源：
OPTICS LETTERS | 2008年 / 33卷 / 01期
关键词：
D O I：
10.1364/OL.33.000007
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
A holographic photopolymer based on SU-8 epoxy resin as the binder and trimethylolpropane ethoxylate triacrylate as the monomer with an iodonium salt photoinitiator was studied. A diffraction efficiency of 93% and a refractive index modulation (An) of 1.3x10(-2) were obtained from a 16 mu m. thick sample with write beam intensities of 50 mW/cm(2) at a wavelength of 514.5 nm, an exposure time of 60 s, and a postbaking at 65 degrees C for 1 h. The material exhibits good heat resistance in the range from 40 degrees C to 160 degrees C and long projected life. (c) 2007 Optical Society of America.
引用
收藏
页码：7 / 9
页数：3
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