Redox Characteristics of Amino Acids Using Low Pressure Water Vapor RF Plasma

被引：0

作者：

Akiyoshi, Yusuke ^{[1
]}

Nakahigashi, Akari ^{[1
]}

Hayashi, Nobuya ^{[1
]}

Kitazaki, Satoshi ^{[2
]}

Iwao, Takuro ^{[2
]}

Koga, Kazunori ^{[2
]}

Shiratani, Masaharu ^{[2
]}

机构：

[1] Saga Univ, Dept Elect & Elect Engn, Fac Sci & Engn, Saga 8408502, Japan

[2] Kyushu Univ, Fac Informat sci & Elect Engn, Dept Elect & Elect Engn, Fukuoka 8190395, Japan

来源：

TENCON 2010: 2010 IEEE REGION 10 CONFERENCE | 2010年

关键词：

plant growth control; redox reaction; water vapor plasma; active species; cystein; thiol base;

D O I：

10.1109/TENCON.2010.5686467

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The redox reaction between cystein and cystine is studied using water vapor plasma produced by the RF discharge concerning the growth control of plants. The stress reaction of plants has been achieved, when the water vapor plasma is irradiated to the seeds or stem, leaf of plants such as radish sprout. The mechanism of the growth control is investigated by analyzing amino acids of cystein and cystine. The water vapor plasma can oxidize and reduce the cystein and cystine, respectively by choosing the plasma parameters. The redox reaction of cystein and cystine in thioredoxin would be the mechanism of the plant control.

引用

页码：1957 / 1959

页数：3

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