Simulation study of signal formation in position sensitive planar p-on-n silicon detectors after short range charge injection

被引:0
|
作者
Peltola, T. [1 ,2 ]
Eremin, V. [3 ]
Verbitskaya, E. [3 ]
Harkonen, J. [2 ,4 ]
机构
[1] Texas Tech Univ, Dept Phys & Astron, Box 41051, Lubbock, TX 79409 USA
[2] Univ Helsinki, Helsinki Inst Phys, POB 64 Gustaf Hallstromin Katu 2, FI-00014 Helsinki, Finland
[3] Ioffe Inst, Politekh Skaya Ul,26, St Petersburg 194021, Russia
[4] Rudjer Boskovic Inst, Zagreb 10000, Croatia
来源
基金
欧盟地平线“2020”;
关键词
Detector modelling and simulations II (electric fields; charge transport; multiplication and induction; pulse formation; electron emission; etc); Radiation-hard detectors; Si microstrip and pad detectors; Simulation methods and programs; MICROSTRIP DETECTORS; RADIATION DETECTORS; THEOREM; LOSSES; LAYER;
D O I
10.1088/1748-0221/12/09/P09032
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Segmented silicon detectors (micropixel and microstrip) are the main type of detectors used in the inner trackers of Large Hadron Collider (LHC) experiments at CERN. Due to the high luminosity and eventual high fluence of energetic particles, detectors with fast response to fit the short shaping time of 20-25 ns and sufficient radiation hardness are required. Charge collection measurements carried out at the Ioffe Institute have shown a reversal of the pulse polarity in the detector response to short-range charge injection. Since the measured negative signal is about 30-60% of the peak positive signal, the effect strongly reduces the CCE even in non-irradiated detectors. For further investigation of the phenomenon the measurements have been reproduced by TCAD simulations. As for the measurements, the simulation study was applied for the p-on-n strip detectors similar in geometry to those developed for the ATLAS experiment and for the Ioffe Institute designed p-on-n strip detectors with each strip having a window in the metallization covering the p(+) implant, allowing the generation of electron-hole pairs under the strip implant. Red laser scans across the strips and the interstrip gap with varying laser diameters and Si-SiO2 interface charge densities (Q(f)) were carried out. The results verify the experimentally observed negative response along the scan in the interstrip gap. When the laser spot is positioned on the strip p(+) implant the negative response vanishes and the collected charge at the active strip increases respectively. The simulation results offer a further insight and understanding of the influence of the oxide charge density in the signal formation. The main result of the study is that a threshold value of Q(f), that enables negligible losses of collected charges, is defined. The observed effects and details of the detector response for different charge injection positions are discussed in the context of Ramo's theorem.
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页数:25
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