Contact resistances of carbon nanotube via interconnects

被引：5
|
作者：
Sun, Xuhui [1 ,2 ]
Li, Ke [2 ]
Wu, Wen [2 ]
Wilhite, Patrick [2 ]
Saito, Tsutomu [2 ]
Yang, Cary Y. [2 ]
机构：
[1] Soochow Univ, Funct Nano & Soft Mat Lab FUNSOM, Suzhou, Peoples R China
[2] Santa Clara Univ, Ctr Nanostructures, Santa Clara, CA 95053 USA
来源：
2009 IEEE INTERNATIONAL CONFERENCE OF ELECTRON DEVICES AND SOLID-STATE CIRCUITS (EDSSC 2009) | 2009年
关键词：
Via interconnector; contact resistance; carbon nanotube synthesis; GROWTH;
D O I：
10.1109/EDSSC.2009.5394173
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We present an extensive characterization of carbon nanotube (CNT) via interconnects grown under various conditions, with particular focus on contact resistance. Si process-compatible elements Ti, Cr, and Al are used as underlayer metals, together with the two most effective catalysts Ni and Fe, to study the growth behaviors and contact resistances of vertically aligned CNTs. The CNT via test structure is designed and fabricated for current-voltage measurements on individual CNTs using atomic force microscope (AFM) current-sensing technique or in situ nanoprobing during scanning electron microscopy (SEM) imaging. By analyzing the dependence of measured resistance on CNT diameter, the CNT-metal contact resistance can be extracted. Relationships between contact resistances and various combinations of catalysts and underlayer metals are investigated.
引用
收藏
页码：131 / +
页数：2
相关论文
共 50 条
  • [21] Analysis of Carbon Nanotube Interconnects and their Comparison with Cu Interconnects
    Alam, Naushad
    Kureshi, A. K.
    Hasan, Mohd
    Arslan, T.
    [J]. 2009 INTERNATIONAL CONFERENCE ON MULTIMEDIA, SIGNAL PROCESSING AND COMMUNICATION TECHNOLOGIES, 2009, : 124 - +
  • [22] Contact resistance between metal and carbon nanotube interconnects: Effect of work function and wettability
    Lim, Seong Chu
    Jang, Jin Ho
    Bae, Dong Jae
    Han, Gang Hee
    Lee, Sunwoo
    Yeo, In-Seok
    Lee, Young Hee
    [J]. APPLIED PHYSICS LETTERS, 2009, 95 (26)
  • [23] Measuring the electrical resistivity and contact resistance of vertical carbon nanotube bundles for application as interconnects
    Chiodarelli, Nicolo'
    Masahito, Sugiura
    Kashiwagi, Yusaku
    Li, Yunlong
    Arstila, Kai
    Richard, Olivier
    Cott, Daire J.
    Heyns, Marc
    De Gendt, Stefan
    Groeseneken, Guido
    Vereecken, Philippe M.
    [J]. NANOTECHNOLOGY, 2011, 22 (08)
  • [24] Back-end-of-line compatible contact materials for carbon nanotube based interconnects
    Fiedler, Holger
    Toader, Marius
    Hermann, Sascha
    Rennau, Michael
    Rodriguez, Raul D.
    Sheremet, Evgeniya
    Hietschold, Michael
    Zahn, Dietrich R. T.
    Schulz, Stefan E.
    Gessner, Thomas
    [J]. MICROELECTRONIC ENGINEERING, 2015, 137 : 130 - 134
  • [25] A Thermal Model for Carbon Nanotube Interconnects
    Mohsin, Kaji Muhammad
    Srivastava, Ashok
    Sharma, Ashwani K.
    Mayberry, Clay
    [J]. NANOMATERIALS, 2013, 3 (02) : 229 - 241
  • [26] A paradigm of carbon nanotube interconnects in the microelectronics
    Sun, Yangyang
    Zhu, Lingbo
    Wong, C. P.
    [J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2006, 231
  • [27] Progress on Carbon Nanotube BEOL Interconnects
    Uhlig, B.
    Liang, J.
    Lee, J.
    Ramos, R.
    Dhavamani, A.
    Nagy, N.
    Dijon, J.
    Okuno, H.
    Kalita, D.
    Georgiev, V.
    Asenov, A.
    Amoroso, S.
    Wang, L.
    Millar, C.
    Konemann, F.
    Gotsmann, B.
    Goncalves, G.
    Chen, B.
    Pandey, R. R.
    Chen, R.
    Todri-Sanial, A.
    [J]. PROCEEDINGS OF THE 2018 DESIGN, AUTOMATION & TEST IN EUROPE CONFERENCE & EXHIBITION (DATE), 2018, : 937 - 942
  • [28] Modeling of Carbon Nanotube (CNT) Interconnects
    Yin, Wen-Yan
    Zhao, Wen-Sheng
    [J]. 2011 15TH IEEE WORKSHOP ON SIGNAL PROPAGATION ON INTERCONNECTS (SPI), 2011, : 79 - 82
  • [29] Extraction of contact resistance in carbon nanofiber via interconnects with varying lengths
    Li, Ke
    Wu, Raymond
    Wilhite, Patrick
    Khera, Vinit
    Krishnan, Shoba
    Sun, Xuhui
    Yang, Cary Y.
    [J]. APPLIED PHYSICS LETTERS, 2010, 97 (25)
  • [30] Magnetic alignment of carbon nanotube interconnects
    In, H. J.
    Nichol, A. J.
    Barbastathis, G.
    [J]. 2007 IEEE/LEOS INTERNATIONAL CONFERENCE ON OPTICAL MEMS AND NANOPHOTONICS, 2007, : 189 - 190
12345