Micro-lens Array Fabricated by Laser Interference Lithography

被引：0
|
作者：
Zhang, Ziang [1 ,2 ,3 ]
Wang, Zuobin [1 ,2 ,4 ]
Wang, Dapeng [1 ,2 ,4 ]
机构：
[1] Changchun Univ Sci & Technol, CNM, Changchun, Peoples R China
[2] Changchun Univ Sci & Technol, JR3CN, Changchun, Peoples R China
[3] Chinese Acad Sci, Natl Astron Observ, Changchun Observ, Changchun, Peoples R China
[4] Univ Bedfordshire, JR3CN, Luton, Beds, England
来源：
2014 INTERNATIONAL CONFERENCE ON MANIPULATION, MANUFACTURING AND MEASUREMENT ON THE NANOSCALE (3M-NANO) | 2014年
关键词：
Micro-lens array; Laser interference lithography; Positive photoresist; Heat flow;
D O I：
暂无
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Micro-lens array (MLA) is a useful optic component. In this paper, we present a method to fabricate the MLA by three-beam laser interference lithography (LIL). Large area MLAs were obtained on photoresist. The MLA feature size was determined by controlling the incident angle of laser beams in LIL. The curvature of MLA was modified through the control of the post bake temperature and time or exposure dosage in LIL. It is convenient to adjust the size of the MLA in the laser interference lithography system. This method has the advantage of large area fabrication.
引用
收藏
页码：78 / 81
页数：4
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