Experimental and modeling study of the capacitance-voltage characteristics of metal-insulator-semiconductor capacitor based on pentacene/parylene

被引:14
|
作者
Wondmagegn, W. T. [1 ]
Satyala, N. T. [1 ]
Mejia-Silva, I. [2 ]
Mao, D. [2 ]
Gowrisanker, S. [2 ]
Alshareef, H. N. [3 ]
Stiegler, H. J. [2 ]
Quevedo-Lopez, M. A. [2 ]
Pieper, R. J. [1 ]
Gnade, B. E. [2 ]
机构
[1] Univ Texas Tyler, Dept Elect Engn, Tyler, TX 75799 USA
[2] Univ Texas Dallas, Dept Mat Sci & Engn, Richardson, TX 75080 USA
[3] King Abdullah Univ Sci & Technol, Dept Mat Sci & Engn, Thuwal 239556900, Saudi Arabia
关键词
Pentacene; Interface; Defects; Poole-Frenkel; Capacitance; Dispersion; THIN-FILM TRANSISTORS; FIELD-DEPENDENT MOBILITY; ELECTRICAL CHARACTERISTICS; INTERFACE STATES; ORGANIC SEMICONDUCTOR; THRESHOLD VOLTAGE; HIGH-PERFORMANCE; CONTACT BARRIER; DEVICES; TEMPERATURE;
D O I
10.1016/j.tsf.2011.02.014
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The capacitance-voltage (C-V) characteristics of metal-insulator-semiconductor (MIS) capacitors consisting of pentacene as an organic semiconductor and parylene as the dielectric have been investigated by experimental, analytical, and numerical analysis. The device simulation was performed using two-dimensional drift-diffusion methods taking into account the Poole-Frenkel field-dependent mobility. Pentacene bulk defect states and fixed charge density at the semiconductor/insulator interface were incorporated into the simulation. The analysis examined pentacene/parylene interface characteristics for various parylene thicknesses. For each thickness, the corresponding flat band voltage extracted from the C-V plot of the MIS structure was more negative than -2.4 V. From the flat band voltage the existence of a significant mismatch between the work functions of the gate electrode and pentacene active material has been identified. Experimental and simulation results suggest the existence of interface charge density on the order of 3 x 10(11) q/cm(2) at the insulator/semiconductor interface. The frequency dispersion characteristics of the device are also presented and discussed. (c) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:4313 / 4318
页数:6
相关论文
共 50 条
  • [1] Capacitance-voltage characteristics of metal-insulator-semiconductor structures (Review article)
    Levchenko, A.
    Mezhov-Deglin, L.
    Chikina, I.
    Shikin, V.
    LOW TEMPERATURE PHYSICS, 2019, 45 (08) : 823 - 840
  • [2] Capacitance-voltage characterization of polyfluorene-based metal-insulator-semiconductor diodes
    Yun, M.
    Ravindran, R.
    Hossain, M.
    Gangopadhyay, S.
    Scherf, U.
    Buennagel, T.
    Galbrecht, F.
    Arif, M.
    Guha, S.
    APPLIED PHYSICS LETTERS, 2006, 89 (01)
  • [3] Photon-assisted capacitance-voltage study of organic metal-insulator-semiconductor capacitors
    Watson, Colin P.
    Devynck, Melanie
    Taylor, D. Martin
    ORGANIC ELECTRONICS, 2013, 14 (07) : 1728 - 1736
  • [4] Capacitance-voltage characteristics of metal-insulator-semiconductor structures based on graded-gap HgCdTe with various insulators
    Voitsekhovskii, A. V.
    Nesmelov, S. N.
    Dzyadukh, S. M.
    THIN SOLID FILMS, 2012, 522 : 261 - 266
  • [5] Enhancement of the stability of capacitance-voltage characteristics of Hg1-xZnxTe-based metal-insulator-semiconductor capacitors by voltage annealing
    Kim, YH
    Kim, SH
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2004, 43 (10A): : L1244 - L1246
  • [6] Capacitance-voltage characteristics of Pt/hBN/WSe2 metal-insulator-semiconductor capacitor doped by charge-transfer process
    Im, HoHyun
    Lee, Geonyeop
    Park, Hyunik
    Lee, Dongryul
    Kim, Jihyun
    APPLIED PHYSICS LETTERS, 2022, 120 (02)
  • [7] AUTOMATED-SYSTEM FOR STUDYING THE CAPACITANCE-VOLTAGE CHARACTERISTICS OF METAL-INSULATOR-SEMICONDUCTOR STRUCTURES AT INFRARED FREQUENCIES
    PONOMAREV, AN
    ZHDAN, AG
    LUSHNIKOV, NA
    KLYOCHKOVA, AM
    INSTRUMENTS AND EXPERIMENTAL TECHNIQUES, 1983, 26 (03) : 706 - 709
  • [8] Modeling of Organic Metal-Insulator-Semiconductor Capacitor
    Manda, Prashanth Kumar
    Karunakaran, Logesh
    Thirumala, Sandeep
    Chakravorty, Anjan
    Dutta, Soumya
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2019, 66 (09) : 3967 - 3972
  • [9] Effect of F doping on capacitance-voltage characteristics of SiCOH low-k films metal-insulator-semiconductor
    叶超
    宁兆元
    Chinese Physics B, 2010, 19 (05) : 557 - 561
  • [10] Effect of annealing on the electrophysical properties of CdTe/HgCdTe passivation interface by the capacitance-voltage characteristics of the metal-insulator-semiconductor structures
    Wang, Xi
    He, Kai
    Chen, Xing
    Li, Yang
    Lin, Chun
    Zhang, Qinyao
    Ye, Zhenhua
    Xin, Liwei
    Gao, Guilong
    Yan, Xin
    Wang, Gang
    Liu, Yiheng
    Wang, Tao
    Tian, Jinshou
    AIP ADVANCES, 2020, 10 (10)