Advanced methods for surface and subsurface defect characterization of optical components

被引：8
|
作者：
Steinert, J [1 ]
Gliech, S [1 ]
Wuttig, A [1 ]
Duparré, A [1 ]
Truckenbrodt, H [1 ]
机构：
[1] Fraunhofer Inst Appl Opt & Precis Engn, Jena, Germany
来源：
OPTICAL METROLOGY ROADMAP FOR THE SEMICONDUCTOR, OPTICAL, AND DATA STORAGE INDUSTRIES | 2000年 / 4099卷
关键词：
surface roughness; subsurface damage; light scattering; scanning force microscopy; surface quality;
D O I：
10.1117/12.405829
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We discuss principles of optical surface quality assessment. The micro topography of well polished fused silica, CaF2 and Si surfaces was examined locally and by covering large sample areas. Power Spectral Densities (PSD) were used for consistent roughness description. Subsurface damage was detected by a modified white light interferometer technique and total scattering measurement.
引用
收藏
页码：290 / 298
页数：9
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