Deposition of chromium aluminum nitride coatings by arc ion plating

Cr-Al-N ternary coatings were deposited by arc ion plating method using isolated Cr target and Al target. The influence of AIN content on the phase change was studied by synthesizing Cr1-xAlxN coatings with different x values. The effects of substrate negative bias on the surface morphology, deposition rate and phase structure were investigated. As the aluminum content increases, the structure of (Cr1-xAlx)N changes from B1(NaCl) phase to B4(wurtzite) phase. The critical content of AIN solubilized in B 1(NaC1) lattice is close to 0.7. With the increasing pulse negative bias, the deposition rate decreases constantly, the droplet contamination is more serious, the ion-etching effect on coating surface is more obvious, and the change of preferred orientation and the shift of XRD peak take place.