Electrodeposition of Cu-Sn alloys from a methanesulfonic acid electrolyte containing benzyl alcohol

被引:35
|
作者
Bengoa, L. N. [1 ,2 ]
Pary, P. [1 ,2 ]
Conconi, M. S. [2 ,3 ]
Egli, W. A. [1 ]
机构
[1] Ctr Invest & Desarrollo Tecnol Pinturas CIDEPINT, CICPBA CONICET, Av 52 E-121 & 122,B1900AYB, La Plata, Buenos Aires, Argentina
[2] Univ Nacl La Plata, Sch Engn, Av 1 & 47, RA-1900 La Plata, Buenos Aires, Argentina
[3] Ctr Tecnol Recursos Minerales & Ceram CETMIC CICP, CICPBA CONICET, Cno Centenario Y 506,B1897ZCA, La Plata, Buenos Aires, Argentina
关键词
Copper; Tin; Electrodeposition; Methanesulfonic acid; Cyanide-free; PERFLUORINATED CATIONIC SURFACTANT; TIN-COPPER ALLOYS; SULFATE-SOLUTIONS; POLYETHER SINTANOL; PHASE-COMPOSITION; CODEPOSITION; BEHAVIOR; BATH; COATINGS; NUCLEATION;
D O I
10.1016/j.electacta.2017.10.027
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Deposition of Cu-Sn alloys from a methanesulfonic acid electrolyte containing small amounts of benzyl alcohol was investigated. Polarisation experiments (cylic and linear sweep voltammetry) were carried out using a rotating disc electrode to identify the reduction and dissolution processes that take place in the system and to determine the effect of the solution constituents on them. Potentiostatic deposition was performed onto a rotating cylinder electrode and the resulting deposits were charactised using SEM and XRD. The results showed that co-deposition of copper and tin is possible even at potentials less cathodic than tin discharge potential. The latter was attributed to the underpotential deposition of Sn2+ on a copper substrate. Smooth and compact deposits were obtained at various deposition potentials and Cu2+ concentrations, with Sn contents between 1.6-62.4 wt.%. Several stable phases, such as pure copper, alpha-CuSn, epsilon-Cu3Sn and eta '-Cu6Sn5 phase, were detected at different operating conditions. Finally, it was found that BA increases the amount of tin in the deposit when Cu2+ concentrations in the solution is kept low, especially at high overpotentials. This additive also inhibits the formation of dendrites and reduces surface roughness. (C) 2017 Elsevier Ltd. All rights reserved.
引用
收藏
页码:211 / 219
页数:9
相关论文
共 50 条
  • [41] Process and theoretical research on electroplating Cu-Sn alloys of low Sn
    Ding, Lifeng
    Chen, Chongyan
    Li, Qiang
    Yuan, Jinxia
    Li, Hongdao
    Xue, Yanfeng
    Dong, Hongmei
    Li, Baoyi
    Niu, Yulan
    JOURNAL OF APPLIED ELECTROCHEMISTRY, 2021, 51 (09) : 1287 - 1299
  • [42] EFFECT OF IRRADIATION ON PHASE TRANSFORMATIONS IN CU-SN AND CU-SN-PU ALLOYS
    KONOBEEVSKI, ST
    LEVITSKI, BM
    PANTELEEV, LD
    DUBROVIN, KP
    JOURNAL OF NUCLEAR MATERIALS, 1962, 5 (03) : 317 - 325
  • [43] A Mossbauer study on the mechanically alloyed Cu-Sn alloys
    Yang, YZ
    Zhu, YL
    Li, QS
    Ma, XM
    Dong, YD
    Chuang, YZ
    JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY, 1998, 14 (06) : 551 - 554
  • [44] An experimental investigation on the solubility of Zr in Cu-Sn alloys
    Pi, Zhao-hui
    Li, Guang-qiang
    Xiao, Yan-ping
    Zhang, Zhan
    Zhao, Zhuo
    Yang, Yong-xiang
    ADVANCES IN MATERIALS AND MATERIALS PROCESSING IV, PTS 1 AND 2, 2014, 887-888 : 324 - +
  • [45] Electrodeposition of Sn-Ag-Cu alloys
    Arai, S
    Kaneko, N
    DENKI KAGAKU, 1997, 65 (12): : 1102 - 1106
  • [46] Electrodeposition of Sn and Au-Sn alloys from a single non-cyanide electrolyte
    He, A.
    Ivey, D. G.
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2012, 23 (12) : 2186 - 2193
  • [47] Calorimetric investigations of liquid Cu-Sb, Cu-Sn and Cu-Sn-Sb alloys
    Lee, J.J.
    Kim, B.J.
    Min, W.S.
    Journal of Alloys and Compounds, 1993, 202 (1-2) : 237 - 242
  • [48] CALORIMETRIC INVESTIGATIONS OF LIQUID CU-SB, CU-SN AND CU-SN-SB ALLOYS
    LEE, JJ
    KIM, BJ
    MIN, WS
    JOURNAL OF ALLOYS AND COMPOUNDS, 1993, 202 : 237 - 242
  • [49] The Role of Chelators in Electrodeposition of Cu-As Alloys from Copper Electrolyte
    Liyuan Chai
    Changqi Xiong
    Weizhi Zeng
    Lin Wu
    Hui Hu
    JOM, 2020, 72 : 3876 - 3886
  • [50] The Role of Chelators in Electrodeposition of Cu-As Alloys from Copper Electrolyte
    Chai, Liyuan
    Xiong, Changqi
    Zeng, Weizhi
    Wu, Lin
    Hu, Hui
    JOM, 2020, 72 (11) : 3876 - 3886