Fabrication of a Si stencil mask for the X-ray lithography using a dry etching technique

被引：10

作者：

Mekaru, Harutaka ^{[1
]}

Takano, Takayuki ^{[1
]}

Awazu, Koichi ^{[2
]}

Maeda, Ryutaro ^{[1
]}

机构：

[1] Natl Inst Adv Ind Sci & Technol, Adv Mfg Res Inst, 1-2-1 Namiki, Tsukuba, Ibaraki 3058564, Japan

[2] Natl Inst Adv Ind Sci & Technol, Ctr Appl Near Field Opt, Tsukuba, Ibaraki 3058562, Japan

来源：

INTERNATIONAL MEMS CONFERENCE 2006 | 2006年 / 34卷

关键词：

D O I：

10.1088/1742-6596/34/1/142

中图分类号：

TP [自动化技术、计算机技术];

学科分类号：

0812 ;

摘要：

We fabricated a Si stencil X-ray mask only in a dry process without electroplating and chemical etching. An X-ray absorber of thickness 30 m with vertical sidewalls was able to be fabricated. In addition, we succeeded in demonstration of the X-ray lithography in the beam line BL-4 of the synchrotron radiation facility TERAS of AIST. Line and space patterns of line width 2 - 200 mu m were transcribed plainly on the surface of a PMMA sheet. It was confirmed that the edge of PMMA microstructures was sharp. There is a possibility that this Si stencil mask can be applied as an X-ray mask for the deep X-ray lithography.

引用

页码：859 / 864

页数：6

共 50 条

[21] Improvements in graphite-based X-ray mask fabrication for ultradeep X-ray lithography
R. Divan
D.C. Mancini
S.M. Gallagher
J. Booske
D. Van der Weide
Microsystem Technologies, 2004, 10 : 728 - 734
[22] Fabrication of a Polymer Micro Needle Array by Mask-Dragging X-Ray Lithography and Alignment X-Ray Lithography
Li Yi-Gui
Yang Chun-Sheng
Liu Jing-Quan
Sugiyama, Susumu
CHINESE PHYSICS LETTERS, 2011, 28 (03)
[23] Fabrication of Si mold using ICP etching for X-ray diffraction grating
Noda, Daiji
Tokuoka, Atsushi
Hattori, Tadashi
EMERGING TECHNOLOGY IN PRECISION ENGINEERING XIV, 2012, 523-524 : 587 - 591
[24] Fabrication of ultrafine x-ray mask using precise crystal growth technique
Miyamoto, Yasuyuki
Furuya, Kazuhito
Yamazaki, Daisuke
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1992, 31 (4 A): : 432 - 435
[25] X-RAY MASK FABRICATION
BRORS, DL
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1982, 333 : 111 - 112
[26] Fabrication of Si field emitters by dry etching and mask erosion
Rakhshandehroo, MR
Pang, SW
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (02): : 612 - 616
[27] Fabrication of x-ray gratings by direct write mask-less lithography
Voronov, D. L.
Diez, S.
Lum, P.
Hidalgo, S. A.
Warwick, T.
Artemiev, N.
Padmore, H. A.
ADVANCES IN X-RAY/EUV OPTICS AND COMPONENTS VIII, 2013, 8848
[28] Fabrication of diffraction grating with high aspect ratio using X-ray lithography technique for X-ray phase imaging
Noda, Daiji
Tanaka, Makoto
Shimada, Kazuma
Hattori, Tadashi
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2007, 46 (02): : 849 - 851
[29] Fabrication of diffraction grating with high aspect ratio using X-ray lithography technique for X-ray phase imaging
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1- 2 Koto, Kamigori-cho, Ako-gun, Hyogo 678-1205, Japan
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1600, 46 (02): : 849 - 851
[30] Fabrication of X-ray mask using poly-Si microstructure for diffraction grating
Shimada, Kazuma
Tsujii, Hiroshi
Noda, Daiji
Hattori, Tadashi
2007 INTERNATIONAL SYMPOSIUM ON MICRO-NANO MECHATRONICS AND HUMAN SCIENCE, VOLS 1 AND 2, 2007, : 448 - 453

← 1 2 3 4 5 →